MoS2 grown on silica substrate
Molybdenum Disulfide (MoS2) is one of the 2D layered transition-metal dichalcogenides (TMDs). They are particularly of interest thanks to their interesting properties, such as flexibility, direct band gap, and unique electric and mechanical properties, however, as well inexpensive, earth-abundant catalysts, also useful as 2D semiconductors in advanced electronic devices. Thus, to ensure reliable and reproducible properties, the fabrication conditions of such monolayers need to be studied.
We measured MoS2 flakes grown by Chemical Vapor Deposition (CVD) under diverse fabrication conditions on 300 nm thick SiO2/Si. We used SEM to localize the flakes (low morphology information), and then using a single probe, we obtained topography information about the height of both the flakes and impurities (did not seem so significant in SEM), qualitative surface charge distribution, and mechanical properties. All these techniques – SEM, AFM, EFM, and phase imaging – were measured at once on both samples. When we compare the results, we see significant differences in phase imaging – see the red triangles.
Measurement modes: AFM topography, SEM, EFM, phase imaging
- Time-efficient multimodal analysis with a single probe
- Straightforward signals’ correlation within NenoView software
- Repeatable localization to the specific flakes
Sample courtesy of Prof. Zdenek Sofer, CTU Prague, Czech Republic