NenoVision at ISTFA 2026 — Booth #610, San Antonio
Meet us at ISTFA 2026 in San Antonio, Texas (October 4–8), the leading global event for the microelectronics failure analysis community. We are bringing LiteScope, our AFM-in-SEM solution, to booth #610, along with two presentations and a user group discussion.
| When | October 4–8, 2026 |
| Where | Henry B. González Convention Center, San Antonio, Texas, USA |
| Booth | #610 |
Tutorial — Sunday, October 4, 9:00 AM, Room 206B
Correlative In-Situ AFM-in-SEM Technique for Advanced Semiconductor Failure Analysis and Material Characterization
Jan Neuman shows how to run in-situ plasma FIB delayering paired with SEM-monitored, repeatable measurement cycles on the exact same region of interest — no vacuum breaks, no re-alignment. Plus EBC-AFM and use cases from defect localization to transistor-level dopant mapping.
Presented by: Jan Neuman, NenoVision
Industry talk — Tuesday, October 6, 3:30 PM, Room 205
Integrated PFIB Delayering and In-Situ AFM-Based Electrical Characterization for Rapid, Site-Specific 3D Failure Analysis of Advanced-Node Devices
PFIB delayering and AFM-based electrical characterization in a single vacuum environment, demonstrated on a 5 nm logic device. Interconnect, via, contact and transistor-level structures measured layer by layer with C-AFM, guided by SEM.
Presented by: Dr. Jamie D. Gravell
SPM User Group Discussion — Wednesday, October 7, 10:40–11:40 AM, Bridge Hall
Jan Neuman joins the community discussion on correlative AFM-in-SEM.
[SEM VLOZIT MAPU HALY S BOOTHEM #610]
See you in San Antonio. Want a dedicated slot at the booth? Tell us what you are working on and we will set time aside.
