Challenges and Opportunities for Site-Specific Failure Analysis in Emerging Chips Architectures

NenoVision

Upcoming webinar: Challenges and Opportunities for Site-Specific Failure Analysis

Dive into the world of semiconductor failure analysis and discover how integrated AFM-in-SEM technology enables in-situ, high-resolution electrical and topographical characterization - right where it matters most.

On Tuesday 3rd of February (17:00 CET - 17:45 CET) you will have the opportunity to learn how Professor Umberto Celano’s group have advanced Electron Beam excited C-AFM with self-sensing probes, utilizing LiteScope to transform traditional C-AFM by combining SEM and AFM techniques into a single, efficient process - streamlining diagnostics and revealing the root causes of device failure with nanoscale precision. Just register on a link below!

Register now:

We’re running this webinar on Microsoft Teams platform so please register via this link:

What you can look forward to:

Explore AFM-in-SEM technology with Alex Johnson and understand its unique strengths in correlating mechanical, electrical, and topographical sample properties
Learn with Professor Umberto Celano about Nanoelectronics Metrology & Failure Analysis Lab and their research into semiconductor material behavior with in-situ electron microscopy
Deep dive into electron-beam excited conductive atomic force microscopy (EBC‑AFM) technique which enables back-contact free electrical measurements of 2D materials offering a non-destructive way to map electrical behavior in 2D materials with precision and efficiency
Live Q&A with Professor Umberto Celano